Research Projects
Research Update
New
Effect:
100-100,000 Times Reduction of Gate Leakage Current of Silicon
Oxide/Oxynitride
We found a new effect, phonon-energy
coupling enhancement (PECE)—an
increase in bond energy coupling through the manipulation of silicon,
oxygen, and deuterium vibrational modes undergoing rapid thermal
process (RTP), so that Si-O and Si-D bonds become
more robust. This results in dramatical reduction of gate leakage
current of silicon oxides and oxynitrides by 2-5orders
of magnitude. This will allow chip producers to
develop faster chips with
reduced power consumption. (See Press Releases:
University
of Kentucky Press Release, Science
Daily, AAAS
EurekAlert, Semiconductor
International Column News.) It became the top 14 news in
2005 after released in Dec 2005 for less than one month (See Top 10
2005 press releases on EurekAlert)!
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