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EE 562, Fall
2000 Professor A. Mason
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| Homework 4 |
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Due: Thursday, 9/21/00 Remember to turn in clearly written and easy to follow homework! 1. An nMOS
transistor is formed in a Si substrate doped with NA=2x1015
cm-3. If
the device is biased for operation in the inversion region, and has VSB
= 0: 2. An
nMOS transistor has the following data: the oxide capacitance is 80nF/cm2,
the work function difference between the gate and the semiconductor is
-0.1 V, fF = 0.3 V, Qb = -2.5x10-8
coulombs/cm2, and Qss = 10-8 coulombs/cm2. 3. An
n-channel transistor has a substrate concentration of NA =
1.4 x 1017 cm-3, mnCox = 188 mA/V2, W=6mm, L=0.6 mm, and Vth=0.8V. 4.
An nMOS transistor in the saturation region is measured to have
the drain current of 20 mA
when VDS = Veff.
When VDS is increased by 0.5V, ID increases
to 23 mA. 5. An
n-channel enhancement mode MOSFET has parameters: Vth=2V,
K=0.4mA/V2 (K=½mCOXW/L) 6. An
nMOS transistor has parameters W=100 m, L=10 mCOX = 20 mA/V2,l=0.01V-1, tox=0.12mm, ff=0.3V, Vt0=1.1V, NA=1015
cm-3. For the
following cases, you should prepare a table of values (at least 3-4
values for each case, appropriately spread over the range of interest)
and then plot those values. |
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