Dimitris Kouzoudis, Ph.D.

Objective

Full-time technical or R/D position in the industry utilizing my skills as a scientist to support, design, and test products, and services.

Employment

1999 - present, University of Kentucky, Lexington, KY

Research Associate

Department of Electrical Engineering

Conducted research on magneto-elastic sensor materials for monitoring different environmental conditions such as pressure, humidity, fluid-flow velocity, chemical analytes and phases transitions. Measured the dielectric properties of carbon nanotube materials. Developed programming codes for data modeling. Supervised a team of post-doctoral and graduate students. Operated, built and maintained laboratory equipment. Responsible for inventory management. Evaluated literature to gain insight on current methods as well as adapting these procedures to ongoing work. Wrote manuscripts for publication in peer reviewed journals.

1994 - 1999, Ames Laboratory, US Department of Energy, Ames, IA

Research Assistant

Fabricated and processed new materials in thin films by DC/RF magnetron sputtering, thermal evaporation, and glow discharge oxidation. Operated Scanning Electron Microscope to study interfaces in superconducting materials. Performed electromagnetic and thermodynamic measurements on various physical systems. Designed a low temperature He cryostat. Troubleshot and repaired various experimental instruments and electronic devices. Characterized materials using x-rays, JCPDF database, Electron Dispersive Spectroscopy, profilometry, electrical resistivity, and optical microscopy.

1992 - 1994, Iowa State University ,Ames, IA

Teaching Assistant

Taught introductory physics courses. Graded homework, quizzes, and exams. Tutored students in help rooms.

 

Summary of Qualifications

Certifications:
  • Internetworking with Microsoft® TCP/IP on Microsoft® Windows NT® 4.0
  • Implementing and Supporting Microsoft® Windows NT® Server 4.0 in the Enterprise.
  • Implementing and Supporting Microsoft® Windows NT® Server 4.0.
  • Implementing and Supporting Microsoft® Windows NT® Workstation 4.0.
  • Networking Essentials.

Skills:

  • Thin film deposition: DC/RF magnetron sputtering, thermal evaporation, and glow discharge oxidation.
  • Certified user of Scanning Electron Microscope.
  • High vacuum: system designing, building, sealing, and leak testing.
  • Cryogenics: cryostat designing and building and handling of cryogens.
  • Troubleshooting and repairing of various experimental instruments and measuring devices.
  • Fabrication and process of materials in high temperature furnaces with controlled gas flow.
  • Characterization of materials using x-rays, JCPDF database, EDS, SEM, profilometry, electrical resistivity, and optical microscopy.
  • Photolithography and microelectronics fabrication.
  • Optics: light sources, polarizers, modulators, analyzers, diffraction gratings, mirrors, and lock-in amplifiers.
  • Data acquisition and data fitting: GPIB/RS-232 interfacing, LabView
  • Engineering drawing: AutoSketch, AutoCad v.14.
  • Machine Shop: lathe, mill operations.
  • LaTeX technical writing for scientific publications.
  • Operating systems: DOS, Windows 95, Macintosh, and UNIX.
  • Web design, HTML (see http://www.uky.edu/StudentOrgs/GHA/)
  • Operating systems: Windows 95/NT, Unix, Macintosh.
  • Visual Basic 6.0, C++ and FORTRAN programming.
  • SQL Language.
  • Word 97, Excell 97, Access 97
  • Mathematica 2.0
  • Bilingual: English, Greek.

Education

1992 - 1998, Iowa State University, Ames, IA
Doctor of Philosophy, Physics
Earned Ph.D. in December of 1998
Earned Master of Science, Physics, in May of 1996

1984 - 1990, University of Ioannina, Ioannina, Greece
Bachelor of Science, Physics

Relevant Course Work

1999 - present, Sullivan College, Lexington, KY
Microsoft Network Engineering Certification Program

1999 - 1999, Lexington Community College, Lexington, KY
Introduction to Database Design

1992 - 1998, Iowa State University, Ames, IA
Microelectronic Fabrication, Computational Physics, Advanced Calculus.

 

Publications
  • D. Kouzoudis and C. A. Grimes, "Remote query fluid-flow velocity measurement using magnetoelastic thick-film sensors (invited)," to be published in J. Appl. Phys 87.
  • C. A. Grimes and D. Kouzoudis, "Magnetoelastic sensors in combination with nanometer-scale honeycombed thin film ceramic TiO2 for remote query measurement of humidity," to be published in J. Appl. Phys 87.
  • C. A. Grimes, P. G. Stoyanov, D. Kouzoudis, and K. G. Ong, "Remote query pressure measurement using magnetoelastic sensors," Rev. Sci. Instr. 70, 4711 (1999).
  • C.A. Grimes, C. Mungle, D. Kouzoudis, S. Fang, P.C. Eklund, "The 500 MHz to 5.50 GHz Complex Permittivity Spectra of Single-Wall Carbon Nanotube-Loaded Polymer Composites", Chemical Physics Letters, vol. 319, Issue 5-6, pp. 460-464.
  • C. A. Grimes, K. G. Ong, K. Loiselle, P. G. Stoyanov, D. Kouzoudis, Y. Liu,C. Tong, and F. Tefiku, "Magnetoelastic sensors for remote query environmental monitoring," J. Smart Mater. Struct. 8, 639 (1999).
  • D. Kouzoudis, M. J. Breitwisch, and D. K. Finnemore, "Edge barrier pinning for a single superconducting vortex," Phys. Rev. B 60, 10508 (1999).
  • D. Kouzoudis, "Exact analytical partition function and energy levels for a Heisenberg ring of N=6 spin 1/2 sites,"J. Magn. Magn. Mater. 189, 366-376 (1998).
  • J. E. Ostenson, M. J. Breitwisch, D. Kouzoudis, and D. K. Finnemore, "Growth of a Transient Phase during Bi(2212) to Bi(2223) Transformation", Advances in Cryogenic Engineering (Materials), Vol. 44, Edited by Balachandran et al., Plenum Press, New York, 1998.
  • M. J. Breitwisch, D. Kouzoudis, J. E. Ostenson, D. K. Finnemore, and U. Balachandran, "Characterization of Interfacial Growth Between Bi(2212) and Ag Coating," IEEE Trans. Appl. Super. 7, 1691 (1997).
  • D. Kouzoudis, "Heisenberg s=1/2 ring consisting of a prime number of atoms, "J. Magn. Magn. Mater. 173, 259-265 (1997).
  • D. K. Finnemore, Ming Xu, D. Kouzoudis, T. Bloomer, M. J. Kramer, S. McKernan, U. Balachandran, and P. Haldar, "Growth of nucleation sites on Pb-doped Bi(2212)," Appl. Phys. Lett. 68, 556 (1996).

References

Available upon request.