Online Scheduler [Read-only Mode]

Week
05/04/2008 - 05/10/2008

View schedule:

April 2008
S	M	T	W	T	F	S
		1	2	3	4	5
6	7	8	9	10	11	12
13	14	15	16	17	18	19
20	21	22	23	24	25	26
27	28	29	30

May 2008
S	M	T	W	T	F	S
				1	2	3
4	5	6	7	8	9	10
11	12	13	14	15	16	17
18	19	20	21	22	23	24
25	26	27	28	29	30	31

June 2008
S	M	T	W	T	F	S
1	2	3	4	5	6	7
8	9	10	11	12	13	14
15	16	17	18	19	20	21
22	23	24	25	26	27	28
29	30

Sunday,
05/04/2008

12:00am

1:00am

2:00am

3:00am

4:00am

5:00am

6:00am

7:00am

8:00am

9:00am

10:00am

11:00am

12:00pm

1:00pm

2:00pm

3:00pm

4:00pm

5:00pm

6:00pm

7:00pm

8:00pm

9:00pm

10:00pm

11:00pm

Annealing Furnace

Atomic Force Microscope 1

Atomic Force Microscope 2 (With isolation chamber)

Atomic Layer Deposition

Cleanbench - Acid (rm 365)

Cleanbench - Solvent (rm 361)

Doping Furnace

E-beam Evaporator

EBL software key

Electron Bean Lithography

General Furnace

Misc Charges

Oxidation Furnace

Photolithography

Plasma Enhanced Chemical Vapor Deposition (PECVD)

Plasma Etch

Quartz Micro Balance (QMB)

Rapid Thermal Processing (RTP)

Reactive Ion Etching (RIE)

SE Software Key

Spectroscopic Ellipsometer

Sputtering

Sputtering 2 (multi target)

Thermal Evaporator (Edwards)

Thermal Evaporator 2 (Bell Jar)

Monday,
05/05/2008

12:00am

1:00am

2:00am

3:00am

4:00am

5:00am

6:00am

7:00am

8:00am

9:00am

10:00am

11:00am

12:00pm

1:00pm

2:00pm

3:00pm

4:00pm

5:00pm

6:00pm

7:00pm

8:00pm

9:00pm

10:00pm

11:00pm

Annealing Furnace

Atomic Force Microscope 1

Atomic Force Microscope 2 (With isolation chamber)

Atomic Layer Deposition

Cleanbench - Acid (rm 365)

Cleanbench - Solvent (rm 361)

Doping Furnace

E-beam Evaporator

EBL software key

Electron Bean Lithography

General Furnace

Misc Charges

Oxidation Furnace

Photolithography

Plasma Enhanced Chemical Vapor Deposition (PECVD)

Plasma Etch

Quartz Micro Balance (QMB)

Rapid Thermal Processing (RTP)

Reactive Ion Etching (RIE)

SE Software Key

Spectroscopic Ellipsometer

Sputtering

Sputtering 2 (multi target)

Thermal Evaporator (Edwards)

Thermal Evaporator 2 (Bell Jar)

Tuesday,
05/06/2008

12:00am

1:00am

2:00am

3:00am

4:00am

5:00am

6:00am

7:00am

8:00am

9:00am

10:00am

11:00am

12:00pm

1:00pm

2:00pm

3:00pm

4:00pm

5:00pm

6:00pm

7:00pm

8:00pm

9:00pm

10:00pm

11:00pm

Annealing Furnace

Atomic Force Microscope 1

Atomic Force Microscope 2 (With isolation chamber)

Atomic Layer Deposition

Cleanbench - Acid (rm 365)

Cleanbench - Solvent (rm 361)

Doping Furnace

E-beam Evaporator

EBL software key

Electron Bean Lithography

General Furnace

Misc Charges

Oxidation Furnace

Photolithography

Plasma Enhanced Chemical Vapor Deposition (PECVD)

Plasma Etch

Quartz Micro Balance (QMB)

Rapid Thermal Processing (RTP)

Reactive Ion Etching (RIE)

SE Software Key

Spectroscopic Ellipsometer

Sputtering

Sputtering 2 (multi target)

Thermal Evaporator (Edwards)

Thermal Evaporator 2 (Bell Jar)

Wednesday,
05/07/2008

12:00am

1:00am

2:00am

3:00am

4:00am

5:00am

6:00am

7:00am

8:00am

9:00am

10:00am

11:00am

12:00pm

1:00pm

2:00pm

3:00pm

4:00pm

5:00pm

6:00pm

7:00pm

8:00pm

9:00pm

10:00pm

11:00pm

Annealing Furnace

Atomic Force Microscope 1

Atomic Force Microscope 2 (With isolation chamber)

Atomic Layer Deposition

Cleanbench - Acid (rm 365)

Cleanbench - Solvent (rm 361)

Doping Furnace

E-beam Evaporator

EBL software key

Electron Bean Lithography

General Furnace

Misc Charges

Oxidation Furnace

Photolithography

Plasma Enhanced Chemical Vapor Deposition (PECVD)

Plasma Etch

Quartz Micro Balance (QMB)

Rapid Thermal Processing (RTP)

Reactive Ion Etching (RIE)

SE Software Key

Spectroscopic Ellipsometer

Sputtering

Sputtering 2 (multi target)

Thermal Evaporator (Edwards)

Thermal Evaporator 2 (Bell Jar)

Thursday,
05/08/2008

12:00am

1:00am

2:00am

3:00am

4:00am

5:00am

6:00am

7:00am

8:00am

9:00am

10:00am

11:00am

12:00pm

1:00pm

2:00pm

3:00pm

4:00pm

5:00pm

6:00pm

7:00pm

8:00pm

9:00pm

10:00pm

11:00pm

Annealing Furnace

Atomic Force Microscope 1

Atomic Force Microscope 2 (With isolation chamber)

Atomic Layer Deposition

Cleanbench - Acid (rm 365)

Cleanbench - Solvent (rm 361)

Doping Furnace

E-beam Evaporator

EBL software key

Electron Bean Lithography

General Furnace

Misc Charges

Oxidation Furnace

Photolithography

Plasma Enhanced Chemical Vapor Deposition (PECVD)

Plasma Etch

Quartz Micro Balance (QMB)

Rapid Thermal Processing (RTP)

Reactive Ion Etching (RIE)

Week05/04/2008 - 05/10/2008

Week
05/04/2008 - 05/10/2008