Reactive Ion Etching (RIE) Request Form

 

 

Name
Advisor
Date and Time
  You must also reserve on the calendar here or your request will not be approved.
   
Gases N2 O2 SF6 C4F8
   
RF Process  
RF Power 20-400watts
Pressure 10-200mtorr
Total Gas Flows 150sccm maximum
   
ICP Process  
ICP Power 200-1000watts
RF Power 20-400watts
Pressure 10-200mtorr
Total Gas Flows 150sccm maximum
   
General  
Notes