Reactive Ion Etching (RIE)

RIE etching is combinations of chemical and kinetic etching that can produce very anisotropic etch profiles. Ours is used primarily for silicon and silicon dioxide etching. Our RIE is found in room 365 of ASTeCC building.

More Information

"Reactive-ion etching." Wikipedia, The Free Encyclopedia. 12 Dec 2007, 01:10 UTC. Wikimedia Foundation, Inc. 13 Feb 2008 <http://en.wikipedia.org/w/index.php?title=Reactive-ion_etching&oldid=177337180>.