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Equipment and Facilities

Since research into nm-scale materials is multidisciplinary many shared facilities are utilized.  This gives students a great opportunity to learn about many techniques as well as flexibility in research directions

Within the group laboratory there is 

electrochemical station, membrane transport equipment

Schlink line and standard synthetic chemistry equipment

2-zone tube furnace and CVD growth

Low temperature with applied magnetic field transport measurement station

Probe Station,  AFM, Wire Bonder, Vacuum Oven, spin coater, UV-vis, Student Computers, membrane characterization systems


Shared micro/nano-fabrication facility

Center for Nanoscale Science and Engineering (CeNSE)

Class 100 clean room

Wafer cleaning station

Spin coating station

4 furnace bank of 3-zone Lindberge/Blue oxidation and dopant diffusion furnaces

Karl Suss MJB3 photolithography alignment station

Sloan 1A profilometer

Gaertner 117A ellipsometer

Plasma enhanced Chemical Vapor Deposition system (TekVac PECVD-60-R)

Plasmatic reactive ion etching station

Technice ion beam etching

Torr International E-beam evaporation with crystal quartz monitor

Edwards FL 400 Thermal evaporation with crystal quartz monitor

Five  target sputter deposition


Materials Characterization

SEM, TEM, AFM, XRD with UK's Electron Microscope Facility


Chemical Characterization

Utilize the shared  facilities of the Chemistry Department, Environment Research Training Laboratory