Jeffrey Todd Hastings, Ph.D.

Associate Professor

Research Areas: Biological Sensors, Biotechnology, Chemical Sensors, Nano-fabrication, Nanotechnology, Photonics

University of Kentucky, College of Engineering
Electrical and Computer Engineering - ECE
352 ASTeCC
Lexington, KY 40506-0286
Phone: 859-218-6544
Fax: 859-257-3092
Email: hastings@engr.uky.edu


Professional preparation

Ph.D., Electrical Engineering,  Massachusetts Institute of Technology 2003
M.S., Electrical Engineering,  Purdue University, West Lafayette, IN 1998
Centre College, Danville, KY Physics B.S. 1996

Appointments

2009-present Associate Professor with tenure, Department of Electrical and Computer Engineering, University of Kentucky, Lexington, KY.

2003-2009 Assistant Professor, Department of Electrical and Computer Engineering, University of Kentucky, Lexington, KY.

1998-2003 NSF Graduate Fellow and Research Assistant, NanoStructures Laboratory /Research Laboratory of Electronics, Massachusetts Institute of Technology; Cambridge, MA.

1996-1998 Research Assistant, Department of Electrical and Computer Engineering and Center for Collaborative Manufacturing, Purdue University; West Lafayette, IN.

Recent Publications

  1. E. U. Donev and J. T. Hastings, “Liquid-precursor electron-beam-induced deposition of Pt nanostructures: dose, proximity, resolution,” Nanotechnology, 20, p. 505302, (2009).
  2. E. U. Donev and J. T. Hastings, “Electron-Beam-Induced Deposition of Platinum from a Liquid Precursor,” Nano Letters, 9, pp. 2715-2718 (2009).
  3. C. B. Samantaray and J. T. Hastings, “Amino-propyl-triethoxy-silane on aluminum fiducial grids for spatial-phase-locked electron-beam lithography,” Journal of Vacuum Science & Technology B, 27, pp. 2558-2562, (2009).
  4. Yang and J.T. Hastings, “FPGA Implementation of Real-time Spatial-Phase Locking for Electron Beam Lithography,” Journal of Vacuum Science & Technology B., 26, pp. 2316-
    2321 (2008).
  5. Y. Yang and J. T. Hastings, “Real-time Spatial Phase Locking for Vector-Scan Electron Beam Lithography,” Journal of Vacuum Science & Technology B., 25, pp. 2072-2076,
    (2007)
  6. V. Karre, P. D. Keathley, G. Jing, and J. T. Hastings, “Direct Electron-Beam Patterning of Teflon AF,” IEEE Transactions on Nanotechnology, 8, pp. 139-141 (2009).
  7. J. Guo, P. D. Keathley, and J. T. Hastings, “Dual-mode surface-plasmon-resonance sensors using angular interrogation,” Opt. Lett., vol. 33, pp. 512-514 (2008).
  8. J. T. Hastings, “Optimizing Surface-Plasmon Resonance Sensors for Limit of Detection Based on a Cramer Rao Bound,” IEEE Sensors Journal, 8, pp. 170-175 (2008).
  9. C. B. Samantaray and J. T. Hastings, “Self-assembled monolayer fiducial grids for spatialphase-locked electron-beam lithography,” Journal of Vacuum Science & Technology B, 26, pp. 2351-2355 (2008).
  10. J. T. Hastings, J. Guo, P. D. Keathley, P. B. Kumaresh, Y. Wei, S. Law, and L. G. Bachas, “Optimal self-referenced sensing using long- and short- range surface plasmons,” Opt. Express, 15, pp. 17661-17672 (2007).