Photolithography Request Form

Name    
Advisor    
Date and Time    
  You must also reserve on the calendar here or your request will not be approved.    
       
Equipment needed Spin Coater Mask Aligner Cleanbench (solvent)
       
Spin Coater Parameters      
Resist type 1 If other please specify
Spin speed 1(RPM)    
Resist type 2 If other please specify
Spin speed 2 (RPM)    
       
Mask Aligner Paramters      
Exposure time 1    
Exposure time 2    
       
Cleanbench (solvent)      
Developer type 1 Develop time 1
Developer type 2 Develop time 2
Other Cleanbench Procedures    
       
General      
Notes    
       

Clean the spin coater after use. Wipe up all spilled resist. Do not use clean bench gloves for puting resist on your samples.